Moriguchi, Japan

Syunji Nakai

This inventor holds 1 USPTO granted patent. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Syunji Nakai. Retrieved from https://idiyas.com/inventor/syunji-nakai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Syunji Nakai: Innovator in Surface Smoothing Technology

Introduction

Syunji Nakai is a notable inventor based in Moriguchi, Japan. He has made significant contributions to the field of surface treatment technology, particularly through his innovative patent related to defect compensation methods.

Latest Patents

Nakai holds a patent for a "Defect compensation method for smoothing a surface of a transparent plate." This method involves radiating an ArF excimer laser beam to address defects on the surface of a transparent plate. The laser beam is directed using a specially designed mask that corresponds to the shape of the defect. The technology allows for adjustments in the beam size and energy distribution, ensuring effective treatment of various defect types.

Career Highlights

Syunji Nakai is associated with Sharp Kabushiki Kaisha Corporation, where he has been instrumental in advancing laser treatment technologies. His work has garnered attention for its practical applications in improving the quality of transparent materials.

Collaborations

Nakai has collaborated with notable colleagues, including Osamu Miyazaki and Kazuya Yoshimura. Their combined expertise has contributed to the development of innovative solutions in the field.

Conclusion

Syunji Nakai's contributions to surface smoothing technology exemplify the impact of innovative thinking in addressing complex challenges. His work continues to influence advancements in material treatment processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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