Omuta, Japan

Syuhei Hara

This inventor holds 1 USPTO granted patent and 7 published patent applications. Top assignee: Mitsui Minings & Melting Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Syuhei Hara. Retrieved from https://idiyas.com/inventor/syuhei-hara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Syuhei Hara: Innovator in Tantalate Dispersion Technology

Introduction

Syuhei Hara is a notable inventor based in Omuta, Japan. He has made significant contributions to the field of materials science, particularly in the development of tantalate dispersions. His innovative work has led to advancements that are beneficial for various applications in technology and industry.

Latest Patents

Hara holds a patent for a novel tantalate dispersion that contains no hardly-volatile organic components and exhibits high dispersibility in water. This tantalate dispersion includes tantalum or tantalate and amine in water. The dispersion is characterized by an intensity ratio (5.5°/29°) of an intensity at 2θ=5.5° to an intensity at 2θ=29° being 1.00 or more in an X-ray diffraction pattern. This innovative approach enhances the usability of tantalate compounds in various applications.

Career Highlights

Syuhei Hara is associated with Mitsui Mining & Smelting Co., Ltd., where he has been instrumental in research and development efforts. His work focuses on improving material properties and developing new applications for tantalate compounds. Hara's dedication to innovation has positioned him as a key figure in his field.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Syuhei Hara's contributions to tantalate dispersion technology exemplify the impact of innovative thinking in materials science. His patent reflects a commitment to advancing technology and improving material applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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