Hiroshima, Japan

Syouitirou Hayashi

This inventor holds 2 USPTO granted patents. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Syouitirou Hayashi. Retrieved from https://idiyas.com/inventor/syouitirou-hayashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1993

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2 patents (USPTO):Explore Patents

Title: Syouitirou Hayashi: Innovator in Computer Scanning Technology

Introduction

Syouitirou Hayashi is a notable inventor based in Hiroshima, Japan. He has made significant contributions to the field of computer technology, particularly in the area of scanning devices. With a total of 2 patents to his name, Hayashi continues to push the boundaries of innovation.

Latest Patents

One of Hayashi's latest inventions is a scanner designed specifically for computers. This device aims to enhance the efficiency and accuracy of scanning processes, making it a valuable tool for both personal and professional use.

Career Highlights

Hayashi is currently employed at Mitsubishi Electric Corporation, where he applies his expertise in technology and innovation. His work at this esteemed company has allowed him to develop cutting-edge solutions that address the needs of modern computing.

Collaborations

Throughout his career, Hayashi has collaborated with talented individuals such as Masaharu Sawatani and Koji Asakura. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of innovative technologies.

Conclusion

Syouitirou Hayashi is a prominent figure in the realm of computer technology, with a focus on scanning innovations. His contributions through patents and collaborations highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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