Yokohama, Japan

Syoji Oikawa

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1977.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Syoji Oikawa. Retrieved from https://idiyas.com/inventor/syoji-oikawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1977

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1 patent (USPTO):Explore Patents

Title: Syoji Oikawa: Innovator in Etching Solution Regeneration

Introduction

Syoji Oikawa is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of chemical engineering, particularly in the regeneration of etching solutions used in printed circuit board manufacturing.

Latest Patents

Oikawa holds a patent for a process that regenerates etching solutions. This innovative method involves the electrolysis of an etching solution containing copper ions, which is separated into cathode and anode compartments. In this process, copper is deposited on an electrode in the cathode compartment, while chlorine formed in the anode compartment is absorbed into a caustic soda solution. This method allows for the recycling of etching solutions, making the process more environmentally friendly and efficient. He has 1 patent to his name.

Career Highlights

Syoji Oikawa has worked at Hitachi, Ltd., where he has been able to apply his expertise in chemical processes. His work has contributed to advancements in the manufacturing of printed circuit boards, which are essential components in modern electronics.

Collaborations

Oikawa has collaborated with notable colleagues such as Hajime Inoue and Fumio Harada. These partnerships have fostered innovation and have been instrumental in the development of new technologies in their field.

Conclusion

Syoji Oikawa's contributions to the regeneration of etching solutions highlight his role as an innovator in the field of chemical engineering. His work not only advances technology but also promotes sustainability in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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