Company Filing History:
Years Active: 2003
Title: Sylvie Harrison: Innovator in Dielectric Film Technology
Introduction
Sylvie Harrison is a notable inventor based in Brigham, California. She has made significant contributions to the field of semiconductor technology, particularly in the deposition of dielectric films. Her innovative methods have paved the way for advancements in optical film quality.
Latest Patents
Harrison holds a patent for a "Method of depositing a thick dielectric film." This method involves the deposition of thick dielectric films on a substrate by building up multiple layers using Plasma Enhanced Chemical Vapor Deposition (PECVD) in a reactor. Each layer has a thickness less than the final thickness of the film to be deposited. The reactor is cleaned between the deposition of each layer, allowing for the formation of high-quality optical films. This patent highlights her expertise in enhancing film quality through innovative techniques.
Career Highlights
Sylvie Harrison is currently employed at Dalsa Semiconductor Inc., where she continues to develop and refine her techniques in semiconductor manufacturing. Her work has been instrumental in improving the performance and reliability of electronic components.
Collaborations
Harrison collaborates with her coworker, Stephane Blain, who also contributes to the advancements in their field. Together, they work on projects that push the boundaries of semiconductor technology.
Conclusion
Sylvie Harrison's contributions to the field of dielectric film technology demonstrate her innovative spirit and commitment to excellence. Her patent and ongoing work at Dalsa Semiconductor Inc. reflect her significant impact on the industry.