Sylvia B Thompson

Title: The Innovative Contributions of Sylvia B. Thompson

Introduction

Sylvia B. Thompson is a notable inventor based in Phoenix, Arizona. She has made significant contributions to the field of semiconductor technology, particularly in the area of boron doping processes for silicon wafers. Her innovative approach has garnered attention in the industry and has led to the development of a unique patent.

Latest Patents

Thompson holds a patent for a "Partial Vacuum Boron Diffusion Process." This method presents a uniform and reproducible technique for boron doping of closely spaced silicon wafers in a single batch. The process utilizes specific ranges of reactant gas compositions, flow rates, and pressures to achieve superior results. The patent illustrates the use of BCl.sub.3 as a boron source gas, along with H.sub.2 and O.sub.2 as oxidant gases. Notably, the method achieves optimal results when BCl.sub.3 and H.sub.2 O are present in the reaction chamber at pressures less than 10 Torr (1.3 kPa) and at specific molar ratios.

Career Highlights

Sylvia B. Thompson has had a distinguished career at Motorola Corporation, where she has applied her expertise in semiconductor processes. Her work has not only advanced the technology but has also contributed to the company's reputation as a leader in innovation.

Collaborations

Thompson has collaborated with her coworker, Dervin L. Flowers, to further enhance the research and development of semiconductor technologies. Their partnership has been instrumental in driving forward innovative solutions in the industry.

Conclusion

Sylvia B. Thompson's contributions to the field of semiconductor technology through her innovative patent and work at Motorola Corporation highlight her role as a significant inventor. Her advancements in boron doping processes continue to influence the industry and pave the way for future innovations.