Potsdam, NY, United States of America

Sylas LaPlante

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Clarkson University, E.i. Dupont De Nemours and Company. Active years: 2012.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Sylas LaPlante: Innovator in Copper Particle Technology

Introduction

Sylas LaPlante is an accomplished inventor based in Potsdam, NY (US). He has made significant contributions to the field of materials science, particularly in the development of copper particles. His innovative approach has led to advancements that are crucial for various industrial applications.

Latest Patents

LaPlante holds a patent for a "Method for producing dispersed, crystalline, stable to oxidation copper particles." This method involves preparing copper particles in the absence of polymeric dispersants by rapidly reducing a Cu(I) salt with an Fe(II) carboxylic acid complex in water. The resulting microns-sized copper powders contain only organics that decompose at low temperatures, ensuring they do not interfere with sintering processes and the formation of conductive copper structures. He has 1 patent to his name.

Career Highlights

Throughout his career, LaPlante has worked with notable organizations, including E.I. du Pont de Nemours and Company and Clarkson University. His work has been instrumental in advancing the understanding and application of copper materials in various technologies.

Collaborations

LaPlante has collaborated with esteemed colleagues such as Daniel V. Goia and Ionel Halaciuga. These partnerships have further enriched his research and development efforts.

Conclusion

Sylas LaPlante's innovative work in the field of copper particle technology showcases his dedication to advancing materials science. His contributions are paving the way for future developments in conductive materials.

Profile summary based on public USPTO records.
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