Swee Hong Choo

Title: Innovations of Swee Hong Choo

Introduction

Swee Hong Choo is a notable inventor based in Singapore, recognized for his contributions to the field of photomask technology. His innovative approach has led to the development of a unique process that enhances the fabrication of photomasks, which are essential in semiconductor manufacturing.

Latest Patents

One of Swee Hong Choo's significant patents is titled "Alternating phase shift mask and method for fabricating the alignment monitor." This patent describes a new process for fabricating an alternating phase-shifting photomask that includes an alignment monitor. The invention involves providing an opaque layer over a substrate, which is then patterned to create a mask pattern. A phase-shifting pattern is formed on the substrate, with a portion dedicated to the alignment monitor, allowing for precise testing of the alignment between the mask pattern and the phase-shifting pattern. This innovation is crucial for improving the accuracy and efficiency of semiconductor manufacturing processes.

Career Highlights

Swee Hong Choo is associated with Chartered Semiconductor Manufacturing Ltd, a prominent corporation in the semiconductor industry. His work at this company has significantly impacted the development of advanced manufacturing techniques.

Collaborations

Throughout his career, Swee Hong Choo has collaborated with talented individuals, including Shyue Fong Quek and Ting Cheong Ang. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Swee Hong Choo's contributions to the field of photomask technology exemplify the spirit of innovation in the semiconductor industry. His patent and collaborative efforts continue to influence advancements in manufacturing processes.