Frankenberg, Germany

Sven Siegle

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Hollingsworth & Vose Company. Active years: 2015-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sven Siegle. Retrieved from https://idiyas.com/inventor/sven-siegle-cado2v7k

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 32(Granted Patents)


Company Filing History:


Years Active: 2015-2018

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2 patents (USPTO):Explore Patents

Title: Sven Siegle: Innovator in Multi-Layered Filter Media

Introduction

Sven Siegle is a notable inventor based in Frankenberg, Germany. He has made significant contributions to the field of filter media technology. With a total of 2 patents, his work focuses on enhancing the efficiency and functionality of filter materials.

Latest Patents

Sven's latest patents revolve around multi-layered filter media. These innovative fiber webs are designed to serve as effective filter media. Each layer of the filter media is engineered to perform distinct functions. For instance, the first layer improves dust holding capacity, while the second layer enhances efficiency. The third layer provides support and strength to the media. This layered design allows for optimization of each function without compromising the performance of the other layers.

Career Highlights

Sven Siegle is currently associated with Hollingsworth & Vose Company. His work at the company has been instrumental in advancing filter media technology. His innovative approach has garnered attention in the industry.

Collaborations

Sven collaborates with Máté Nagy, a fellow innovator in the field. Their partnership has led to the development of cutting-edge solutions in filter media.

Conclusion

Sven Siegle's contributions to the field of filter media through his innovative patents highlight his expertise and commitment to advancing technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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