Company Filing History:
Years Active: 2019-2021
Title: Suzanne Cosijn: Innovator in Lithographic Technology
Introduction
Suzanne Cosijn is a prominent inventor based in Casteren, Netherlands. She has made significant contributions to the field of lithography, particularly in the measurement of optical elements within lithographic apparatuses. With a total of two patents to her name, her work has advanced the precision and efficiency of lithographic processes.
Latest Patents
One of Suzanne's latest patents focuses on the position measurement of optical elements in a lithographic apparatus. This invention includes a projection system that comprises multiple optical elements designed to project a beam of radiation onto a radiation-sensitive substrate. The apparatus features a metrology frame structure that incorporates measurement systems to assess the position and orientation of the optical elements. The arrangement of the optical elements, patterning device stage, and substrate stage is optimized to define a minimal rectangle that envelops these components, ensuring the metrology frame structure is effectively positioned within this area.
Career Highlights
Suzanne Cosijn is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography. Her role at the company has allowed her to collaborate with other experts in the field, enhancing the development of innovative technologies.
Collaborations
Some of her notable coworkers include Erik Roelof Loopstra and Engelbertus Antonius Fransiscus Van Der Pasch. Their collaborative efforts contribute to the advancement of lithographic technology and the development of new solutions in the industry.
Conclusion
Suzanne Cosijn's contributions to lithographic technology through her patents and work at Carl Zeiss SMT GmbH highlight her role as an influential inventor in the field. Her innovations continue to shape the future of lithography and optical measurement systems.