Suwon, South Korea

Suyoung Lee

This inventor holds 1 USPTO granted patent and 6 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Suyoung Lee. Retrieved from https://idiyas.com/inventor/suyoung-lee-lkr1yws1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Suyoung Lee and His Patent for Defect Inspection

Introduction

Suyoung Lee is an inventor based in Suwon, South Korea. The supplied information identifies him as a man working at Samsung Electronics Ltd. and credits him with 1 patent.

Latest Patents

Lee’s listed patent is titled “Method of Inspecting Defects.” It describes a process for aligning an inspection image with a reference image before checking for defects. The method identifies image peaks that mark pattern positions, filters the images, and selects reference peaks as samples. It then calculates candidate correction constants, chooses a primary correction constant, and applies further corrections to align the reference image with the inspection image. Once aligned, the method compares the inspection patterns with the reference patterns to identify defects.

Career Highlights

The available information highlights Lee’s work on image alignment and automated defect inspection, as described in his patent. His listed professional affiliation is Samsung Electronics Ltd.

Collaborations

The supplied information names Bumjoo Lee as Suyoung Lee’s coworker. No further details about their collaboration are provided.

Conclusion

Suyoung Lee’s listed invention focuses on accurately aligning inspection and reference images to support defect detection, reflecting a practical contribution to inspection technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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