Guangdong, China

Suting Peng

This inventor holds 1 USPTO granted patent. Top assignee: Shenzhen Efercro Electronic Technology Co., Ltd. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Suting Peng. Retrieved from https://idiyas.com/inventor/suting-peng-dwxuq71r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Suting Peng - Innovator in Smart Mask Technology

Introduction

Suting Peng is a notable inventor based in Guangdong, China. He has made significant contributions to the field of electronic devices, particularly with his innovative smart mask system. His work reflects a blend of technology and health, addressing modern needs in personal protective equipment.

Latest Patents

Suting Peng holds a patent for a smart mask system. This system includes an electronic mask that utilizes electronic display technology to show images. It also features an electronic device that interacts with the mask, facilitating data exchange. Additionally, a server is connected to the electronic device, enabling further data interaction. The system is designed to operate through an application program installed on the electronic device, allowing seamless communication between the mask, device, and server. He has 1 patent to his name.

Career Highlights

Suting Peng is currently associated with Shenzhen Efercro Electronic Technology Co., Ltd. His role in the company has allowed him to focus on developing cutting-edge technologies that enhance user experience and safety.

Conclusion

Suting Peng's innovative contributions to smart mask technology exemplify the intersection of health and technology. His work is paving the way for advancements in personal protective equipment, showcasing the importance of innovation in today's world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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