Kolkata, India

Sutapa Dutta

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sutapa Dutta. Retrieved from https://idiyas.com/inventor/sutapa-dutta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sutapa Dutta and Machine-Learning-Based Semiconductor Inspection.

Introduction

Sutapa Dutta is an inventor associated with Kolkata, India, and Applied Materials, Inc. Her patent work addresses the inspection and classification of defects in semiconductor manufacturing.

Latest Patents

Dutta is associated with 1 patent, titled “Optical Inspection-Based Automatic Defect Classification.” The disclosed techniques collect optical inspection data from training samples containing multiple defects and use that data to create a training set with defect descriptions, images, and ground-truth classifications. Multiple machine-learning classifiers are trained to predict defect classifications. Classifiers that meet specified accuracy criteria are selected and then used to classify defects in semiconductor manufacturing samples.

Career Highlights

Dutta’s patent reflects the application of machine learning to semiconductor inspection. By combining optical data with labeled training examples, the disclosed approach aims to support efficient and accurate defect classification.

Collaborations

The patent information also names Navneet Kumar Singh and Arun Ramaswamy Srivatsa as Dutta’s coworkers. The available details do not specify their individual contributions to the invention.

Conclusion

Sutapa Dutta’s patent work focuses on using machine learning to improve defect classification in semiconductor manufacturing, in connection with her work at Applied Materials, Inc.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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