Company Filing History:
Years Active: 2016-2022
Title: Susumu Nogami: Innovator in Plasma Processing Technology
Introduction
Susumu Nogami is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding 2 patents that showcase his innovative approach to semiconductor manufacturing.
Latest Patents
His latest patents include an "Annular member, plasma processing apparatus and plasma etching method." This invention involves an annular member designed to surround a pedestal for receiving a substrate in a plasma processing apparatus. The annular member is composed of quartz and silicon, with a silicon content percentage ranging from 2.5% to 10% by weight. Another notable patent is the "Method of manufacturing semiconductor device," which outlines a process for creating a semiconductor device using a multilayer film formed by alternately laminating films with different dielectric coefficients. This method involves a sequence of gas supply and excitation steps to etch the multilayer film through a mask.
Career Highlights
Susumu Nogami is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work focuses on advancing plasma processing techniques, which are crucial for the production of high-performance semiconductor devices.
Collaborations
He collaborates with talented coworkers, including Wataru Takayama and Shoichiro Matsuyama, who contribute to the innovative environment at Tokyo Electron Limited.
Conclusion
Susumu Nogami's contributions to plasma processing technology and semiconductor manufacturing highlight his role as a key innovator in the field. His patents reflect a commitment to advancing technology and improving manufacturing processes.