Chelmsford, MA, United States of America

Sushanta K Pal


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations of Sushanta K Pal in Nanotube Fabric Technology

Introduction

Sushanta K Pal is an accomplished inventor based in Chelmsford, MA (US). He has made significant contributions to the field of materials science, particularly in the development of porous nanotube fabrics. His innovative methods have the potential to revolutionize various applications in textiles and beyond.

Latest Patents

Sushanta K Pal holds a patent for "Methods for forming porous nanotube fabrics." This patent discloses methods for creating porous nanotube fabrics by forming a porogen-loaded nanotube application solution. The process involves combining nanotube elements with fuel material in a liquid medium, and in some cases, an oxidizer material is also included. The resulting fabric is created by depositing this solution, which, upon heating, allows the fuel material to react and volatize, leaving behind voids that render the fabric porous. This innovative approach opens new avenues for the use of nanotube materials in various industries.

Career Highlights

Sushanta K Pal is currently employed at Zeon Corporation, where he continues to explore advancements in material technologies. His work has garnered attention for its potential applications in various fields, including electronics, healthcare, and environmental solutions.

Collaborations

Throughout his career, Sushanta has collaborated with notable colleagues, including Rahul Sen and Joseph James McDermott. These collaborations have further enriched his research and development efforts, leading to innovative solutions in the field of nanotube technology.

Conclusion

Sushanta K Pal's contributions to the development of porous nanotube fabrics exemplify the impact of innovative thinking in materials science. His patent and ongoing work at Zeon Corporation highlight the importance of research and collaboration in driving technological advancements.

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