Aschaffenburg, Germany

Susanne Schläfer

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Applied Materials, Inc.. Active years: 2014.

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Susanne Schläfer: Innovator in Thermal Management Technologies

Introduction

Susanne Schläfer is a prominent inventor based in Aschaffenburg, Germany. She has made significant contributions to the field of thermal management in film deposition processes. Her innovative work has led to the development of a patented technology that enhances the efficiency of deposition systems.

Latest Patents

Susanne holds a patent titled "Thermal management of film deposition processes." This patent describes a deposition system that includes a vacuum chamber, a deposition source, and a substrate holder. The system is designed to optimize thermal management by utilizing a heat sink that reflects radiative thermal emissions from the substrate. This innovative approach improves the overall performance of film deposition processes.

Career Highlights

Susanne Schläfer is currently employed at Applied Materials, Inc., where she continues to advance her research and development efforts. Her work focuses on enhancing the efficiency and effectiveness of deposition technologies. With her expertise, she has become a valuable asset to her team and the industry.

Collaborations

Throughout her career, Susanne has collaborated with notable colleagues, including Sven Schramm and Edgar Haberkorn. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Susanne Schläfer's contributions to thermal management technologies in film deposition processes highlight her role as a leading inventor in her field. Her patented innovations continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
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