This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Susan Weiher Telford: Innovator in Tungsten Silicide Deposition Technology
Introduction
Susan Weiher Telford is a notable inventor based in Untergruppenbach, Germany. She has made significant contributions to the field of semiconductor manufacturing, particularly in the area of tungsten silicide deposition processes. Her innovative work has led to the development of a patented preconditioning process that enhances the efficiency and effectiveness of deposition chambers.
Latest Patents
Susan Weiher Telford holds a patent for a preconditioning process for treating deposition chambers prior to tungsten silicide deposition. This process involves treating the chamber surfaces with a gaseous silicon source, such as silane, and a tungsten-bearing gas, like WF.sub.6. The method aims to create a silane-based tungsten silicide layer on the chamber surfaces, which is crucial for optimal performance during the deposition of tungsten silicide on active substrates. The patent outlines a two-step process that further enhances the chamber surfaces with a chlorine-substituted silane-based tungsten silicide deposition.
Career Highlights
Susan is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. Her work at Applied Materials has positioned her as a key player in advancing deposition technologies. With her expertise, she has contributed to improving the reliability and performance of semiconductor manufacturing processes.
Collaborations
Throughout her career, Susan has collaborated with esteemed colleagues, including Michio Aruga and Mei Yin Chang. These collaborations have fostered innovation and have been instrumental in the development of advanced technologies in the semiconductor field.
Conclusion
Susan Weiher Telford's contributions to tungsten silicide deposition technology exemplify her innovative spirit and dedication to advancing semiconductor manufacturing. Her patented processes continue to influence the industry, showcasing her role as a leading inventor in this critical field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
