Susan M Gaspar

Title: Susan M Gaspar: Innovator in Microelectronics

Introduction

Susan M Gaspar is a prominent inventor based in Albuquerque, NM (US). She has made significant contributions to the field of microelectronics, particularly in the area of photomask metrology and exposure control.

Latest Patents

Susan holds 2 patents, with her latest innovations focusing on advanced techniques for monitoring and controlling exposure in microelectronics manufacturing. One of her notable patents is titled "Diffracted light from latent images in photoresist for exposure control." This invention provides an arrangement for monitoring the exposure of a photosensitive layer, ensuring that the desired critical dimension for the pattern can be developed accurately. The method involves ascertaining the intensities of diffracted power from an incident beam of radiation, allowing for precise control over the exposure process.

Another significant patent is "Simple CD measurement of periodic structures on photomasks." This invention utilizes a laser scatterometer for noncontact, rapid, and nondestructive measurement of linewidths on photomasks. The technique is based on a rigorous theoretical model, which eliminates the need for calibrations and provides a reliable method for linewidth determination.

Career Highlights

Throughout her career, Susan has worked with esteemed institutions, including the University of New Mexico. Her work has been instrumental in advancing the field of microelectronics and improving manufacturing processes.

Collaborations

Susan has collaborated with notable professionals in her field, including Kirt C Hickman and John R McNeil. Their combined expertise has contributed to the success of her innovative projects.

Conclusion

Susan M Gaspar is a trailblazer in the microelectronics industry, with her patents reflecting her commitment to innovation and excellence. Her contributions continue to shape the future of technology in this critical field.