Company Filing History:
Years Active: 1985-1986
Title: Susan B. Poulin: A Pioneer in Positive Photoresist Development
Introduction
Susan B. Poulin, based in Woburn, MA, is an accomplished inventor known for her significant contributions to the field of photoresist technology. With four patents to her name, she has been instrumental in advancing the methods used for developing positive photoresists, a crucial component in the semiconductor manufacturing process.
Latest Patents
Among her latest innovations, Susan's patents include the development of positive photoresists utilizing cyclic quaternary ammonium compounds. The first patent outlines a method for developing a positive photoresist layer that has been image-wise exposed, involving the use of an alkaline developing composition. This composition effectively removes the exposed areas of the photoresist layer. Additionally, her second patent focuses on the developer composition for positive photoresists using a similar solution, emphasizing the importance of cyclic quaternary ammonium hydroxide agents in the development process.
Career Highlights
Throughout her impressive career, Susan has worked with notable organizations such as Thiokol Corporation and Morton Thiokol Inc. Her work within these companies has allowed her to refine her skills and contribute to the evolution of photoresist technologies, which are essential in various electronic applications.
Collaborations
In her journey as an inventor, Susan has collaborated with talented individuals, including Roger G. Hamel and Ann B. Salamone. These professional relationships have played a significant role in her research and development efforts, leading to groundbreaking advancements in her field.
Conclusion
Susan B. Poulin's innovative work in positive photoresist development highlights her status as a leading inventor in this critical area of technology. With her patents and collaborations, she continues to influence the landscape of semiconductor manufacturing and set the stage for future advancements in photoresist applications.