The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1985
Filed:
Dec. 21, 1983
Applicant:
Inventors:
Susan B Poulin, Woburn, MA (US);
Ann B Salamone, Marble Head, MA (US);
Assignee:
Morton Thiokol, Inc., Chicago, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; C11D / ; C11D / ; C11D / ;
U.S. Cl.
CPC ...
430331 ; 430326 ; 430329 ; 430323 ; 252541 ; 252547 ; 252548 ; 252542 ;
Abstract
A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, the developing composition comprising a solution containing a cyclic quaternary ammonium hydroxide developing agent in a sufficient concentration to remove exposed areas of the layer. The present invention also includes a developing composition for use in the method.
Poulin, Susan. (1985). Developer composition for positive photoresists using solution with (U.S. Patent No. 4556629). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4556629
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile