San Jose, CA, United States of America

Suraj Yadav

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Suraj Yadav. Retrieved from https://idiyas.com/inventor/suraj-yadav

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Suraj Yadav: Innovator in Nanoimprint Lithography

Introduction

Suraj Yadav is a notable inventor based in San Jose, CA, who has made significant contributions to the field of nanoimprint lithography. His innovative approach has led to the development of a unique apparatus that enhances the efficiency and effectiveness of this technology.

Latest Patents

Suraj holds a patent for an "Anti-slippery stamp landing ring." This invention provides methods for performing nanoimprint lithography using an anti-slip landing ring. The patent describes a process chamber that includes a substrate support and a ring with a grid pattern on its top surface. The bottom surface of the ring features a different pattern, which contributes to the overall functionality of the apparatus.

Career Highlights

Suraj Yadav is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to focus on advancing technologies that are crucial for modern manufacturing processes.

Collaborations

Suraj has collaborated with talented coworkers, including Jing Jiang and Amita Joshi, who share his passion for innovation and technology. Their combined efforts contribute to the development of cutting-edge solutions in their field.

Conclusion

Suraj Yadav's contributions to nanoimprint lithography exemplify the spirit of innovation in technology. His patent and work at Applied Materials, Inc. highlight his commitment to advancing manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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