Jeollanam-do, South Korea

Sunmi Kim

This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sunmi Kim. Retrieved from https://idiyas.com/inventor/sunmi-kim-wts2qcky

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Sunmi Kim: Innovator in Substrate Treatment Technology.

Introduction

Sunmi Kim is a notable inventor based in Jeollanam-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Sunmi Kim holds a patent for a "Nozzle and substrate treating apparatus including the same." This apparatus is designed to treat a substrate by utilizing a support unit that holds the substrate in place. The nozzle dispenses liquid plasma to etch a film that is formed on the substrate, thereby improving the overall treatment process.

Career Highlights

Sunmi Kim is currently associated with Semes Co., Ltd., where he applies his expertise in substrate treatment technologies. His work at the company has been instrumental in advancing the capabilities of substrate processing equipment.

Collaborations

Due to space constraints, the collaborations section has been omitted.

Conclusion

Sunmi Kim's contributions to substrate treatment technology exemplify the impact of innovative thinking in the field of engineering. His patent and work at Semes Co., Ltd. highlight his role as a key player in advancing substrate processing techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…