Asan, South Korea

Sunkyun Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sunkyun Park. Retrieved from https://idiyas.com/inventor/sunkyun-park-chb8w52e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Sunkyun Park in Window Manufacturing

Introduction

Sunkyun Park is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of window manufacturing, showcasing his innovative spirit through his patented methods. His work is particularly relevant in the context of modern manufacturing techniques.

Latest Patents

Sunkyun Park holds a patent for a window manufacturing method. This method involves providing a first adhesive on a dummy substrate, placing a first mother substrate on the adhesive, and utilizing a suction stage to attach the mother substrate to the dummy substrate. This innovative approach enhances the efficiency and quality of window production.

Career Highlights

Sunkyun Park is associated with Samsung Display Co., Ltd., a leading company in the display technology sector. His role at Samsung Display has allowed him to contribute to advancements in manufacturing processes, particularly in the area of window production.

Collaborations

Sunkyun Park has worked alongside talented colleagues such as Sung-Shin Kwak and Sunkwan Kim. Their collaborative efforts have likely fostered an environment of innovation and creativity within their projects.

Conclusion

Sunkyun Park's contributions to window manufacturing exemplify the importance of innovation in the industry. His patented methods not only improve production efficiency but also reflect the ongoing advancements in manufacturing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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