Sunil Chandra

Title: Sunil Chandra: Innovator in Chemical Mechanical Polishing

Introduction

Sunil Chandra is a notable inventor based in Oro Valley, AZ (US). He has made significant contributions to the field of chemical mechanical polishing, particularly in the development of polishing slurries that enhance the efficiency of polishing copper.

Latest Patents

Sunil Chandra holds a patent for "Polishing slurries and methods for chemical mechanical polishing." This invention focuses on aqueous polishing slurries that are effective for polishing copper at high rates. The slurries include soluble salts of molybdenum and molybdic acid, both dissolved in an oxidizing agent. The methods described in the patent involve polishing copper using low pressures with a polishing pad and these innovative aqueous slurries.

Career Highlights

Sunil Chandra is currently associated with Climax Engineered Materials, LLC, where he applies his expertise in chemical mechanical polishing. His work has contributed to advancements in the materials used for polishing processes, making them more effective and efficient.

Collaborations

Sunil has collaborated with talented individuals such as Sreehari Nimmala and Suryadevara Vijayakumar Babu. These collaborations have fostered innovation and development in their respective fields.

Conclusion

Sunil Chandra's contributions to the field of chemical mechanical polishing through his innovative patent demonstrate his commitment to advancing technology in this area. His work continues to influence the industry positively.