Gyeongsangnam, South Korea

Sunhwa Yu

This inventor holds 1 USPTO granted patent. Top assignee: Lg Electronics Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sunhwa Yu. Retrieved from https://idiyas.com/inventor/sunhwa-yu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Sunhwa Yu - Innovator in Clothes Treatment Technology

Introduction

Sunhwa Yu is a notable inventor based in Gyeongsangnam, South Korea. She has made significant contributions to the field of clothes treatment technology. Her innovative approach has led to the development of a unique apparatus designed to enhance the efficiency of clothing care.

Latest Patents

Sunhwa Yu holds a patent for a "Clothes treating apparatus with liquid reservoir." This invention features a body containing a drum, a liquid spraying mechanism, and a detachable liquid reservoir. The design allows for effective liquid application during the clothes treatment process, ensuring optimal results.

Career Highlights

Throughout her career, Sunhwa Yu has demonstrated a commitment to innovation and excellence. Her work at LG Electronics Inc. has positioned her as a key player in the development of advanced home appliances. She continues to push the boundaries of technology in the clothing care industry.

Collaborations

Sunhwa Yu has collaborated with talented individuals such as Myoungjong Kim and Deokjoon Jeong. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Sunhwa Yu's contributions to the field of clothes treatment technology exemplify her dedication to innovation. Her patented inventions and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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