Suwon, South Korea

SungKu Baek

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Display Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: SungKu Baek. Retrieved from https://idiyas.com/inventor/sungku-baek

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of SungKu Baek

Introduction

SungKu Baek is an inventive mind based in Yongin-si, South Korea. He has made significant strides in the field of substrate cleaning technology. His work focuses on developing efficient cleaning apparatuses that enhance the cleaning process of substrates.

Latest Patent Applications

SungKu Baek's notable patent application is titled "APPARATUS OF CLEANING SUBSTRATE." This innovative cleaning apparatus includes a cleaning chamber, a first cleaning nozzle, a cover member, an air flow generation unit, and an exhaust unit. The main cleaning chamber is designed with a cleaning space where the substrate is cleaned, featuring a sidewall that defines a first vent hole. The first cleaning nozzle is strategically placed within the main cleaning chamber to spray a first cleaning solution. The cover member encloses the main cleaning chamber and has a side that includes a second vent hole. The air flow generation unit is responsible for supplying air into the cleaning space through the first vent hole, while the exhaust unit is connected to the cover member to suck and expel the air supplied into the cleaning space through the second vent hole.

Conclusion

SungKu Baek's contributions to substrate cleaning technology demonstrate his innovative spirit and commitment to improving cleaning processes. His patent application reflects a thoughtful approach to solving practical challenges in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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