Suwon-si, South Korea

Sungjun Ann

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sungjun Ann. Retrieved from https://idiyas.com/inventor/sungjun-ann-h12njubx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Sungjun Ann

Introduction

Sungjun Ann is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of technology, particularly through his work at Samsung Electronics Ltd. His innovative spirit is reflected in his patent, which showcases his expertise and dedication to advancing technology.

Latest Patents

Sungjun Ann holds a patent titled "COVER WAFER AND METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME." This invention highlights his focus on improving processes within the semiconductor industry, demonstrating his commitment to enhancing efficiency and effectiveness in substrate processing.

Career Highlights

Throughout his career at Samsung Electronics Ltd., Sungjun Ann has been involved in various projects that push the boundaries of technology. His work has not only contributed to the company's success but has also positioned him as a key player in the field of innovation.

Collaborations

Sungjun Ann has collaborated with his coworker, Seungkyu Lim, to further enhance their projects and drive innovation within their team. Their combined efforts have led to advancements that benefit their work and the broader technological landscape.

Conclusion

Sungjun Ann's contributions to technology through his patent and work at Samsung Electronics Ltd. exemplify the spirit of innovation. His dedication to improving processes in the semiconductor industry is commendable and showcases the impact of inventors in shaping the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…