Company Filing History:
Years Active: 2023
Title: Sungjun Ann - Innovator in Plasma Deposition Technology
Introduction
Sungjun Ann is an inventor based in Suwon-si, South Korea. He is known for his contributions to the field of plasma deposition technology. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.
Latest Patent Applications
Sungjun Ann has filed several notable patent applications, including:
1. **PLASMA DEPOSITION APPARATUS AND PLASMA DEPOSITION METHOD** - This application describes a plasma deposition apparatus that includes a process chamber, a substrate stage with an electrostatic chuck, a lower temperature maintenance portion, and a lower electrode. The electrostatic chuck is designed to hold a substrate using electrostatic adsorption force, while the lower temperature maintenance portion cools the substrate. The apparatus also features an exhaust portion for gas removal, an upper electrode facing the lower electrode, a gas supply portion for reaction gas, and two power supplies for plasma generation and ion energy control.
2. **COVER WAFER AND METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME** - This application outlines a method for cleaning a substrate processing apparatus that accommodates a process wafer. The method involves placing a cover wafer on the substrate support, fixing it using the internal electrode, plasma cleaning the processing space, and then removing the cover wafer. The cover wafer is made of silicon carbide (SiC) and has specific roughness characteristics.
Conclusion
Sungjun Ann is an emerging inventor in the field of plasma deposition technology, with innovative applications that showcase his expertise. His work has the potential to contribute significantly to advancements in substrate processing methods.