Samsung Electronics Co., Ltd.

Sungjun Ann

Seungbo Shim

Dougyong Sung

Myungsun Choi

Nam Kyun Kim

Kyuho Kim

Disclosed are plasma etching apparatuses, plasma etching methods, and semiconductor device fabrication methods. The plasma etching apparatus comprises a chamber, an electrostatic chuck in a lower portion of the chamber, a radio-frequency power supply that has a connection with the electrostatic chuck and provides the electrostatic chuck with a radio-frequency power to generate a plasma in the chamber, and a controller that has a connection with the radio-frequency power supply and controls the radio-frequency power.

Growing community of inventors

Seoul, South Korea

Sungjun Ann