Seongnam, South Korea

Sunghoon Yun

This inventor holds 1 USPTO granted patent. Top assignee: Enpulse Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sunghoon Yun. Retrieved from https://idiyas.com/inventor/sunghoon-yun-avtjc48a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Sunghoon Yun in Polishing Technology.

Introduction

Sunghoon Yun is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of polishing technology, particularly through his innovative patent related to polishing pads.

Latest Patents

Sunghoon Yun holds a patent for a polishing pad, a method for manufacturing the polishing pad, and a polishing method that applies the polishing pad. This polishing pad includes a polyurethane that features a silane repeating unit in its main chain. The invention is designed to minimize defects on a substrate after polishing, achieving about 40 or fewer defects when used with a fumed silica slurry.

Career Highlights

Sunghoon Yun is associated with Enpulse Co., Ltd., where he continues to develop and refine his innovative ideas in polishing technology. His work has been instrumental in advancing the efficiency and effectiveness of polishing processes in various applications.

Conclusion

Sunghoon Yun's contributions to polishing technology through his patent demonstrate his commitment to innovation and excellence in his field. His work not only enhances the quality of polishing processes but also reflects the importance of continuous improvement in industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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