Livermore, CA, United States of America

Sung-Wook Chung

This inventor holds 1 USPTO granted patent. Top assignee: Northwestern University. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung-Wook Chung. Retrieved from https://idiyas.com/inventor/sung-wook-chung-83deix7v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Innovations of Sung-Wook Chung in Nanotechnology

Introduction

Sung-Wook Chung is a prominent inventor based in Livermore, CA (US). He has made significant contributions to the field of nanotechnology, particularly through his innovative work on multicomponent nanorods. His research focuses on creating nanostructures with tailored electronic and chemical properties.

Latest Patents

Sung-Wook Chung holds a patent for multicomponent nanorods. This patent describes multicomponent nanorods that have segments with differing electronic and/or chemical properties. These nanorods can be precisely tailored to create controlled gaps or to produce diodes or resistors, depending on the identities of the components that make up the segments. Additionally, macrostructural composites of these nanorods are also disclosed in his patent. He has 1 patent to his name.

Career Highlights

Sung-Wook Chung is affiliated with Northwestern University, where he continues to advance his research in nanotechnology. His work has garnered attention for its potential applications in various fields, including electronics and materials science.

Collaborations

Some of his notable coworkers include Lidong Qin and Sungho Park, who contribute to the collaborative research environment at Northwestern University.

Conclusion

Sung-Wook Chung's innovative work in the development of multicomponent nanorods showcases his expertise in nanotechnology. His contributions are paving the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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