Incheon, South Korea

Sung Min Lee

This inventor holds 1 USPTO granted patent. Top assignee: Microsoft Technology Licensing, LLC. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Min Lee. Retrieved from https://idiyas.com/inventor/sung-min-lee-120hyt2t

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovations of Sung Min Lee

Introduction

Sung Min Lee is an accomplished inventor based in Incheon, South Korea. He has made significant contributions to the field of textile technology, particularly with his innovative approach to solvent-free coatings.

Latest Patents

Sung Min Lee holds a patent for a solvent-free textile coating. This invention relates to the development of solvent-free films and textiles that can effectively receive these films. His work in this area showcases his commitment to environmentally friendly solutions in textile manufacturing.

Career Highlights

Sung Min Lee is currently associated with Microsoft Technology Licensing, LLC. His role at this prominent company allows him to leverage his expertise in technology and innovation, contributing to advancements in various fields.

Collaborations

He has collaborated with notable colleagues, including James Alec Ishihara and Kyra Gould. These partnerships highlight the collaborative nature of innovation and the importance of teamwork in achieving groundbreaking results.

Conclusion

Sung Min Lee's contributions to the field of textile technology, particularly through his solvent-free coating patent, reflect his innovative spirit and dedication to sustainable practices. His work continues to inspire advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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