Gwangju, South Korea

Sung Kyu Kang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Jusung Engineering Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Kyu Kang. Retrieved from https://idiyas.com/inventor/sung-kyu-kang-dstjecon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations by Sung Kyu Kang

Introduction

Sung Kyu Kang is a notable inventor based in Gwangju, South Korea. He has made significant contributions to the field of substrate processing technology. His work focuses on enhancing the efficiency and effectiveness of thin film deposition processes.

Latest Patents

Sung Kyu Kang holds a patent for an "Apparatus for treating substrate and method for treating substrate." This invention discloses a substrate processing apparatus and method that facilitates the sequential or repetitive execution of a thin film deposition process and a surface treatment process within a single process space. The apparatus includes a process chamber, a substrate supporter, a chamber lid, and a gas distributor. The gas distributor spatially separates the process gas for thin film deposition from the surface treatment gas, allowing for localized distribution on the substrate supporter.

Career Highlights

Sung Kyu Kang is currently associated with Jusung Engineering Co., Ltd., where he continues to innovate in substrate processing technologies. His work has contributed to advancements in the manufacturing processes of various industries.

Collaborations

He collaborates with talented individuals such as Hun Jung and Jae Chan Kwak, who share his commitment to innovation and excellence in their field.

Conclusion

Sung Kyu Kang's contributions to substrate processing technology exemplify the impact of innovative thinking in engineering. His patent reflects a significant advancement in the efficiency of thin film deposition processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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