Iksan, South Korea

Sung-Jin Noh

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Dongwoo Fine-Chem. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung-Jin Noh. Retrieved from https://idiyas.com/inventor/sung-jin-noh-4qd08fq7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sung-Jin Noh: Inventor of a Metal Thin-Film Substrate

Introduction

Sung-Jin Noh is an inventor associated with Iksan, South Korea, and Dongwoo Fine-Chem. His patent work concerns metal thin-film substrates and their use in transparent displays.

Latest Patents

Noh is associated with 1 patent: “Metal Thin Film Substrate, Transparent Display Comprising Same, Method for Patterning Metal Thin Film Substrate, and Method for Manufacturing Transparent Display.” The invention describes a glass substrate with a pressure-sensitive adhesive layer on one surface and a metal layer formed over that adhesive layer. The adhesive layer contains a silicone-based pressure-sensitive adhesive. The disclosure also covers a transparent display incorporating the substrate, a method for patterning the substrate, and a method for manufacturing the display.

Career Highlights

Noh’s listed patent work connects materials and substrate design with transparent-display manufacturing. His association with Dongwoo Fine-Chem places this work within the company’s innovation and patent activity.

Collaborations

Jun-Gu Lee and Ki-Joon Park are identified as Noh’s coworkers. Their names are provided as professional associations, though specific roles in the patent are not stated.

Conclusion

Sung-Jin Noh’s patent activity centers on a silicone-adhesive metal thin-film substrate and related processes for producing transparent displays.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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