Fremont, CA, United States of America

Sung Hyun Hong

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2017-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Hyun Hong. Retrieved from https://idiyas.com/inventor/sung-hyun-hong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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4 patents (USPTO):Explore Patents

Title: Innovations of Sung Hyun Hong

Introduction

Sung Hyun Hong is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of memory devices, holding a total of 4 patents. His work focuses on advanced materials and methods that enhance the performance of 3D flash memory applications.

Latest Patents

One of his latest patents is titled "Dielectric-metal stack for 3D flash memory application." This patent describes a method for forming a stack of film layers for use in 3D memory devices. The process begins with providing a substrate in a processing chamber of a deposition reactor. Subsequently, process gases suitable for forming a dielectric layer are introduced, creating a dielectric layer on the substrate. Following this, additional process gases are used to form a metallic layer on the dielectric layer, and then a metallic nitride adhesion layer is added. This sequence is repeated to achieve the desired number of layers.

Another significant patent is "Conformal amorphous carbon for spacer and spacer protection applications." This method involves forming a nitrogen-doped amorphous carbon layer on a substrate. The process includes depositing a sacrificial dielectric layer, creating patterned features by removing portions of this layer, and then depositing a nitrogen-doped amorphous carbon layer. The nitrogen-doped layer is selectively removed to provide filled patterned features within sidewall spacers formed from the carbon layer.

Career Highlights

Sung Hyun Hong is currently employed at Applied Materials, Inc., where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of memory devices, making them more efficient and reliable.

Collaborations

He has collaborated with notable coworkers such as Bok Hoen Kim and Xinhai Han, contributing to various projects that push the boundaries of technology in the semiconductor industry.

Conclusion

Sung Hyun Hong's contributions to the field of memory devices through his innovative patents and work at Applied Materials, Inc. highlight his role as a leading inventor in the industry. His advancements in materials and methods are paving the way for future developments in 3D flash memory technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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