This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Innovations of Sung-hyuck Kim in Photolithography
Introduction
Sung-hyuck Kim is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of photolithography, particularly in enhancing the resolution of photo masks. With a total of 2 patents to his name, Kim's work is pivotal in advancing semiconductor manufacturing technologies.
Latest Patents
Kim's latest patents include a photo mask capable of improving resolution by utilizing polarization of light and a method of manufacturing the same. This innovative photo mask enhances the resolution of a photolithography process by polarizing the exposure light. The design features a transparent substrate made of quartz, a reflection pattern on the substrate, and a light-blocking pattern on the reflection pattern. The external reflection pattern defines a light-transmitting area by exposing portions of the transparent substrate.
Another significant patent involves masks that each have a central main pattern region and a peripheral phantom pattern region. This design includes light-transmitting features in both pattern regions that share the same shape and pitch. The method of forming the mask effectively obviates optical proximity effects, ensuring precision in semiconductor fabrication.
Career Highlights
Sung-hyuck Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of photolithography. His work is instrumental in improving the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Kim collaborates with talented coworkers, including In-kyun Shin and Gi-sung Yoon, who contribute to the innovative projects at Samsung Electronics.
Conclusion
Sung-hyuck Kim's contributions to photolithography through his patents and work at Samsung Electronics highlight his role as a key innovator in the semiconductor industry. His advancements in photo mask technology are essential for the future of high-resolution manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile