This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2009-2014.
Location History:
- Gyeonggi-do, KR (2009)
- Yongin-si, KR (2012 - 2014)
Company Filing History:
Years Active: 2009-2014
Title: Innovations by Sung-Hyuck Kim
Introduction
Sung-Hyuck Kim is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work primarily focuses on photomasks and methods for pattern formation in semiconductor devices.
Latest Patents
One of his latest patents is for a pellicle that includes a frame with a square shape and a buffer zone that divides the lower surface of the frame into multiple portions. This innovation is crucial for enhancing the performance of photomasks. Another significant patent involves methods of exposing a substrate to light, which includes forming a first photosensitive layer pattern with distinct patterns in different regions of a substrate. This method utilizes a photomask with specific mask regions to transfer patterns effectively, thereby improving the manufacturing process of semiconductor devices.
Career Highlights
Sung-Hyuck Kim is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to contribute to cutting-edge technologies that are essential for modern electronics.
Collaborations
He collaborates with talented coworkers such as Gi-Sung Yoon and In-kyun Shin, who share his commitment to innovation in semiconductor technology.
Conclusion
Sung-Hyuck Kim's contributions to the field of semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the industry. His advancements in photomask technology and pattern formation methods are paving the way for future developments in semiconductor manufacturing.