Sung-Hwan Byun

Title: Innovations of Sung-Hwan Byun in Semiconductor Technology

Introduction

Sung-Hwan Byun is a notable inventor based in Incheon, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for pattern formation.

Latest Patents

Sung-Hwan Byun holds a patent titled "Method for forming a minute pattern and method for manufacturing a semiconductor device using the same." This patent describes a method for forming a minute pattern that includes the formation of a mask layer on an object being patterned. The mask layer is patterned to create a first mask pattern with a width larger than a predetermined width. Following this, the first mask pattern undergoes thermal treatment to yield a second mask pattern with a smaller width. A polymer layer is then formed on the second mask pattern, which reacts to create a hardened layer at the boundary surface, resulting in a third mask pattern that closely matches the predetermined width. This innovative approach overcomes the limitations of existing photolithography equipment and enables the manufacturing of semiconductor devices with a critical dimension below approximately 100 nm.

Career Highlights

Sung-Hwan Byun is currently employed at Samsung Electronics Co., Ltd., where he continues to advance semiconductor technologies. His work has been instrumental in enhancing the capabilities of semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Bong-Cheol Kim and Dae-youp Lee, contributing to various projects within the semiconductor field.

Conclusion

Sung-Hwan Byun's innovative methods and contributions to semiconductor technology exemplify the importance of advancements in this critical industry. His patent and ongoing work at Samsung Electronics Co., Ltd. highlight his role as a key figure in the evolution of semiconductor manufacturing.