Asan, South Korea

Sung Hun Hong

This inventor holds 2 USPTO granted patents and 7 published patent applications and 2 EPO patents. Top assignee: Puritech Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Hun Hong. Retrieved from https://idiyas.com/inventor/sung-hun-hong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2024

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2 patents (USPTO):Explore Patents

Title: Innovations by Sung Hun Hong

Introduction

Sung Hun Hong is a notable inventor based in Asan, South Korea. He has made significant contributions to the field of gas dissolution technology. With a total of 2 patents, his work focuses on innovative systems that enhance the efficiency of gas mixing and dissolution in water.

Latest Patents

One of his latest patents is a "System for Dissolving Gas." This inventive concept provides a comprehensive system that includes a water supply unit, a gas supply unit, and a gas solution generation unit. The system is designed to generate gas solutions with varying concentrations, ultimately producing a third gas solution with smaller gas particles. Another significant patent is the "Venturi Nozzle Apparatus." This apparatus is engineered to mix water and gas effectively, allowing for the dissolution of gas in water through a specialized housing and injector unit.

Career Highlights

Sung Hun Hong has worked with several companies, including Puritech Co., Ltd. and Puri Tech GmbH. His experience in these organizations has contributed to his expertise in developing innovative solutions for gas dissolution.

Collaborations

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Conclusion

Sung Hun Hong's contributions to gas dissolution technology through his patents demonstrate his innovative spirit and commitment to advancing this field. His work continues to influence the industry and inspire future inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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