Kumi, South Korea

Sung Ho Chang

This inventor holds 2 USPTO granted patents. Top assignee: Lg Electronics Inc.. Active years: 2007-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Ho Chang. Retrieved from https://idiyas.com/inventor/sung-ho-chang-ca9oy2j6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 1.3

ph-index = 1


Location History:

  • Kumi, KR (2007)
  • Kumi-shi, KR (2009)

Company Filing History:


Years Active: 2007-2009

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2 patents (USPTO):Explore Patents

Title: Innovations of Sung Ho Chang

Introduction

Sung Ho Chang is a notable inventor based in Kumi, South Korea. He has made significant contributions to the field of plasma display technology. With a total of 2 patents, his work focuses on improving the efficiency and quality of plasma display panels.

Latest Patents

Chang's latest patents include a "Plasma display panel with paste composite for white-black formation." This invention discloses a paste composite that enhances abrasion resistance and reduces processing time and costs. The composite consists of a resin, plasticizer, powder, and solvent in specific weight percentages. Another significant patent is the "Plasma display panel and fabricating method thereof," which prevents color mixture between adjacent cells. This design features a phosphor layer that improves emission characteristics and simplifies the manufacturing process.

Career Highlights

Sung Ho Chang is currently employed at LG Electronics Inc., where he continues to innovate in the field of display technology. His work has contributed to advancements in plasma display panels, making them more efficient and cost-effective.

Collaborations

Chang collaborates with Seung Tea Park, enhancing the development of innovative technologies in their field.

Conclusion

Sung Ho Chang's contributions to plasma display technology through his patents reflect his commitment to innovation and excellence. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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