Osan, South Korea

Sung Chul Jeon

This inventor holds 1 USPTO granted patent. Top assignee: Fine Semitech Corp.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Chul Jeon. Retrieved from https://idiyas.com/inventor/sung-chul-jeon-ej4fa50h

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations by Sung Chul Jeon

Introduction

Sung Chul Jeon is a notable inventor based in Osan-si, South Korea. He has made significant contributions to the field of multi-component curable compositions. His innovative approach has led to the development of a unique method that enhances the application of these compositions.

Latest Patents

Sung Chul Jeon holds 1 patent for his invention titled "Method for applying multi-component curable composition." This patent describes an apparatus and method for applying a multi-component curable composition. The method involves applying a plurality of fluids constituting the composition to a surface layer by layer. It also includes acquiring a two-dimensional image of all the fluids applied, measuring the height of the fluids, and calculating the total volume of the composition.

Career Highlights

Sung Chul Jeon is associated with Fine Semitech Corp., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the applications of curable compositions in various industries.

Collaborations

He collaborates with talented coworkers, including Dong Young Shin and Sun Woo Lee, who contribute to the innovative environment at Fine Semitech Corp.

Conclusion

Sung Chul Jeon is a prominent inventor whose work in multi-component curable compositions showcases his dedication to innovation. His contributions are paving the way for advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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