Sung Cho

Title: **Innovations by Inventor Sung Cho in Plasma Processing Technology**

Introduction

Sung Cho is a notable inventor based in Fremont, California, recognized for his contributions to the field of plasma processing technology. With a total of two patents to his name, Cho has made significant advancements that enhance the precision and effectiveness of manufacturing processes. His expertise in creating efficient methods and apparatuses reflects his commitment to innovation in technology.

Latest Patents

Sung Cho's latest patents include groundbreaking methods and apparatuses focused on profile and CD uniformity control through plasma oxidation treatment. The first patent details an apparatus designed for forming spacers, which features a plasma processing chamber equipped with essential components such as a substrate support, pressure regulator, antenna, bias electrode, gas inlet, and gas outlet. This innovative system utilizes a gas source comprising both oxygen and anisotropic etch gases. The embedded controller processes various computer-readable codes that guide the treatment of substrates within the chamber, fostering the formation of silicon oxide coatings through plasma oxidation.

The second patent explores a method of forming spacers from a silicon-containing layer, employing plasma oxidation to establish horizontal and sidewall coatings. This approach selectively etches different surfaces of the spacer layer while protecting the sidewalls, ensuring a high level of uniformity and precision in the manufacturing processes.

Career Highlights

Sung Cho is currently employed at Lam Research Corporation, a prominent player in semiconductor manufacturing technologies. His role involves pioneering research and development initiatives that aim to refine and optimize plasma processing techniques. Cho’s contributions have significantly enhanced the efficiency and efficacy of tools used in the semiconductor production line.

Collaborations

Throughout his career, Cho has collaborated with esteemed colleagues such as Qinghua Zhong and Gowri Kamarthy. Their combined expertise fosters a vibrant research environment, enabling the exploration of new ideas and solutions within the realm of semiconductor processing and technology innovations.

Conclusion

In summary, Sung Cho is a distinguished inventor whose work is instrumental in advancing plasma processing technology. With his two patents, he has set a precedent for innovation within the industry, ensuring a greater degree of efficiency and precision in manufacturing. His contributions at Lam Research Corporation, along with collaborative efforts with talented colleagues, highlight his vital role in the ever-evolving landscape of technology and innovation.