Suwon, South Korea

Sun Young Yang

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Sdi Co., Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sun Young Yang. Retrieved from https://idiyas.com/inventor/sun-young-yang-ltsqb535

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations by Sun Young Yang

Introduction

Sun Young Yang is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of organic layer compositions, particularly in the development of methods for forming patterns. His work is recognized for its potential applications in various technologies.

Latest Patents

Yang holds a patent for an organic layer composition, an organic layer, and a method of forming patterns. This composition includes a polymer that features a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent. This innovation is crucial for advancements in organic electronics and related fields.

Career Highlights

Sun Young Yang is currently employed at Samsung SDI Co., Inc., where he continues to push the boundaries of technology through his research and development efforts. His work at this leading company has allowed him to be at the forefront of innovation in the industry.

Collaborations

Yang has collaborated with talented coworkers, including Sun-Hae Kang and Youn-Hee Nam, who contribute to the dynamic research environment at Samsung SDI Co., Inc. Their combined expertise fosters a culture of innovation and creativity.

Conclusion

Sun Young Yang's contributions to the field of organic layer compositions exemplify the spirit of innovation. His patent and ongoing work at Samsung SDI Co., Inc. highlight the importance of collaboration in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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