Seongnam, South Korea

Sun-Young Choi

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sun-Young Choi. Retrieved from https://idiyas.com/inventor/sun-young-choi-blvf3tdq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Seongnam-si, KR (2011)
  • Gyeonggi-do, KR (2011)

Company Filing History:


Years Active: 2011

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2 patents (USPTO):Explore Patents

Title: Sun-Young Choi: Innovator in Mask Technology

Introduction

Sun-Young Choi is a notable inventor based in Seongnam, South Korea. He has made significant contributions to the field of mask technology, particularly in the semiconductor industry. With a total of 2 patents, his work focuses on enhancing the precision and efficiency of mask inspection and formation processes.

Latest Patents

One of his latest patents is titled "Phase-shift mask and method of forming the same." This invention involves an attenuated phase-shift mask (PSM) where a phase-shift layer and a light-shielding layer are sequentially stacked on a transparent substrate. The method includes removing these layers to create a light-shielding pattern and a phase-shift pattern that partially exposes the substrate. A transmitting portion is then formed by partially removing the light-shielding pattern, which includes a transmittance controller made from a metal with a high absorption coefficient. This innovation aims to decrease intensity deviation between 0 and 1 order beams, thereby improving the processing margin of the exposure process.

Another significant patent is the "Method of inspecting mask using aerial image inspection apparatus." This method allows for the precise inspection of a mask's entire surface at high speed, taking into account the optical effects of the mask. It involves designing a target mask layout and extracting an effective mask layout using inspection images. The effective layout is then used in a wafer simulation tool to calculate the wafer image, allowing for the detection of optical effects by comparing the target and effective layouts.

Career Highlights

Sun-Young Choi is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has positioned him as a key player in the development of advanced mask technologies.

Collaborations

He has collaborated with notable coworkers, including Hee-bom Kim, who is also recognized for her contributions in the field.

Conclusion

Sun-Young Choi's innovative patents and contributions to mask technology reflect his expertise and commitment to advancing the semiconductor industry. His work continues to influence the efficiency and precision of mask inspection and formation processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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