Sun-Hak Lee

Title: Innovations of Sun-Hak Lee in Semiconductor Technology.

Introduction

Sun-Hak Lee is a notable inventor based in Kyungki-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of CMOS transistors. With a total of 2 patents, his work has advanced the capabilities of electronic devices.

Latest Patents

One of his latest patents is focused on a MOS transistor and its fabrication method. This innovation provides a CMOS transistor with a relatively high breakdown voltage. The design includes an N-type epitaxial layer on a P-type substrate, with a heavily doped N-type buried layer and a heavily doped P-type base layer situated between them. An N-type sink region is positioned near the edge of the NMOS region, surrounded by twin wells. N+ source and drain regions are formed in their respective wells. The configuration allows for a breakdown to occur between the sink and isolation regions when a high voltage is applied. Additionally, twin wells are formed in the PMOS region, with P+ source and drain regions also established in their respective wells. This design ensures that a breakdown occurs between a buried region and the isolation region under high voltage conditions.

Career Highlights

Sun-Hak Lee is currently employed at Fairchild Korea Semiconductor Ltd., where he continues to innovate in the semiconductor industry. His expertise in transistor technology has positioned him as a key player in the development of advanced electronic components.

Collaborations

He collaborates with Kyung-Oun Jang, who is also a significant contributor to their projects. Their teamwork enhances the innovative capabilities of their research and development efforts.

Conclusion

Sun-Hak Lee's contributions to semiconductor technology, particularly through his patents on CMOS transistors, demonstrate his commitment to advancing electronic device performance. His work continues to influence the industry and pave the way for future innovations.