Company Filing History:
Years Active: 1999
Title: Sumiyoshi Okada: Innovator in Semiconductor Cleaning Technology
Introduction
Sumiyoshi Okada is a notable inventor based in Nagano-ken, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the cleaning processes of semiconductor wafers. His innovative methods have improved the efficiency and quality of semiconductor production.
Latest Patents
Okada holds a patent for a method of cleaning semiconductor wafers after lapping. This patent outlines a process that includes slicing a monocrystalline ingot into a semiconductor wafer, followed by chamfering, lapping, acid-etching, and mirror-polishing. The cleaning method involves using a strong-alkaline aqueous solution after lapping and before acid-etching. This technique ensures that the surface of the semiconductor wafer is dissolved by an amount ranging from 4-8 µm, preventing the generation of protrusions on the wafer's outer circumferential end during subsequent processing steps.
Career Highlights
Sumiyoshi Okada is associated with Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His work has been instrumental in advancing cleaning techniques that enhance the overall quality of semiconductor wafers. His innovative approach has garnered attention and respect within the industry.
Collaborations
Okada has collaborated with Seiichi Miyazaki, contributing to the development of advanced semiconductor cleaning technologies. Their partnership has led to improvements in manufacturing processes that benefit the semiconductor industry.
Conclusion
Sumiyoshi Okada's contributions to semiconductor cleaning technology exemplify the importance of innovation in manufacturing processes. His patented methods have set new standards in the industry, ensuring higher quality and efficiency in semiconductor production.