Company Filing History:
Years Active: 2003-2004
Title: Sumito Ootsuki: Innovator in Semiconductor Technology
Introduction
Sumito Ootsuki is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on the development of advanced semiconductor devices and manufacturing methods.
Latest Patents
One of his latest patents is for a semiconductor device and method for the manufacture thereof. This innovative semiconductor device features a switching transistor with a drain region and a source region formed from an impurity-diffused region in the surface layer of a semiconductor substrate. A first insulation film is applied to the substrate, and a capacitor is formed on top of this film. The capacitor consists of a lower electrode, an inter-electrode insulation film made from either ferroelectric or high-permittivity dielectric materials, and an upper electrode. To protect the inter-electrode insulation film, a second insulation film is created to cover its side face. The design allows for connections between the drain region, source region, and capacitor electrodes through electrode wiring, enhancing the device's functionality.
Career Highlights
Sumito Ootsuki is currently employed at Kabushiki Kaisha Toshiba, where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.
Collaborations
He has collaborated with notable coworkers, including Osamu Hidaka and Hiroshi Mochizuki, further enriching his work and contributions to the field.
Conclusion
Sumito Ootsuki's advancements in semiconductor technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of complex semiconductor systems, making him a valuable asset to the industry.