Company Filing History:
Years Active: 2010
Title: **Sumio Nakatake: Innovator in Plasma Film Technology**
Introduction
Sumio Nakatake, an accomplished inventor based in Hachioji, Japan, is recognized for his contributions to the field of plasma film technology. With a focus on enhancing film formation processes, Nakatake's inventions play a crucial role in advancing the capabilities of related technological applications.
Latest Patents
Nakatake holds a patent for a novel plasma film forming system. This innovative apparatus features two first electrodes connected to a power source alongside two grounded second electrodes, arranged in a specific configuration that optimizes the film formation process. The design includes a first flow passage enabling raw material gas to pass through, while a plasma discharge space in a second flow passage allows for the excitation of gases necessary for film creation. Remarkably, the system prevents the adherence of film to essential apparatus components, such as electrodes, ensuring efficient operation.
Career Highlights
Throughout his career, Sumio Nakatake has demonstrated a commitment to innovation. Working with notable industry players has enriched his experience and provided a platform for his groundbreaking ideas. His patent is a testament to his technical proficiency and ability to address complex challenges in plasma technology.
Collaborations
Nakatake collaborates with skilled professionals in his field, including colleagues Shinichi Kawasaki and Hiroya Kitahata. Together, they contribute to the ongoing development and refinement of technology related to plasma film formation, pushing the boundaries of what is possible in this area.
Conclusion
Sumio Nakatake's work continues to have a significant impact on plasma technology and film formation processes. His innovative patent reflects his dedication to technological advancement and highlights the collaborative spirit of research and development within his team at Sekisui Chemical Co., Ltd. As the industry evolves, Nakatake's contributions will undoubtedly influence future innovations in the field.