Sekisui Chemical Co., Ltd.

Sumio Nakatake

Yuji Eguchi

Setsuo Nakajima

Junichiro Anzai

Hiroya Kitahata

Shinichi Kawasaki

Yoshinori Nakano

In a plasma film forming apparatus, two first electrodesconnected to a power sourceand two grounded second electrodesare arranged in the order of the second electrode, the first electrode, the first electrodeand the second electrode. A first flow passageformed between the central first electrodesallows a raw material gas (first gas) for being formed into a film to pass therethrough. A plasma discharge spaceof a second flow passage formed between the first and second electrodeson the both sides allows an excitable gas (second gas) to pass therethrough, which excitable gas is exited by plasma such that the raw material can be formed into a film, but that the excitable gas itself is merely excited but not formed into a film. Those gases are converged at a crossing partbetween the first and second flow passages and blown off via a common blowoff passage. By this, the apparatus composing members such as electrodes can be prevented from being adhered with a film.

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Hachioji, Japan

Sumio Nakatake