Iwate, Japan

Sumio Aisawa

This inventor holds 1 USPTO granted patent. Top assignee: National University Corporation, Iwate University. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sumio Aisawa. Retrieved from https://idiyas.com/inventor/sumio-aisawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Sumio Aisawa

Introduction

Sumio Aisawa is a notable inventor based in Iwate, Japan. He has made significant contributions to the field of materials science, particularly in the manufacturing of laminates. His work has implications for various industries, including electronics and construction.

Latest Patents

Sumio Aisawa holds a patent for a "Method for manufacturing laminate." This innovative method involves creating a laminate that includes a resin substrate and a metal layer. The process consists of two main steps: first, a base layer is formed using a triazine-based silane coupling agent on the resin substrate. Second, a molecular bonding layer is created with a catalytic triazine-based silane coupling agent on the base layer. This patent showcases Aisawa's expertise in advanced material manufacturing.

Career Highlights

Aisawa is affiliated with the National University Corporation, Iwate University, where he contributes to research and development in materials science. His academic background and research focus have positioned him as a key figure in his field.

Collaborations

One of his notable collaborators is Jing Sang, with whom he has worked on various projects related to laminate manufacturing and material properties.

Conclusion

Sumio Aisawa's innovative work in laminate manufacturing highlights his contributions to materials science and technology. His patent reflects a commitment to advancing manufacturing techniques that can benefit multiple industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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